Gallium Arsenide Production Line Equipment

This series of equipment is mainly used in conjunction with a wet machine to etch the release layer between a thin photovoltaic film and its grown gallium arsenide substrate using a specific concentration and temperature of HF solution, thereby separating the GaAs solar film from the substrate. Using a polymer film attached to a gallium arsenide laminated wafer as input, and outputting a separate gallium arsenide laminated wafer and a solar film attached to a polymer support, in order to achieve the goal of reusing the output gallium arsenide substrate.