This series of equipment includes perovskite solar cells OLED、 Specialized equipment for the research and development of industries such as lithium batteries, quantum dot LEDs, and OPVs, capable of producing nanoscale oxide, nitride, metal, and other thin film materials through manufacturing processes.
The main function of this equipment glove box is to remove O2, H2O, and organic gases. Widely used in ultra pure environments without water, oxygen, or dust.
Specification
| project | parameter | project | parameter |
| Device dimensions | 1950mm × 780mm × 900mm | Equipment operation interface | touch screen+ PLC |
| Overall leakage rate | ＜0.05 vol%h | External dimensions of spin coating system | 400 × 400 |
| Gas purity | H2O ＜ 1 ppm，O2 ＜ 1 | Automatic pressure control | +15 mbar，-15 mbar |
| Material of the tank | The main material of the box is 304 stainless steel | Equipment failure rate | ≤1% |
| POM Glove hole ring | The caliber is 220mm | product pass rate | ≥99% |
| Power supply | 220V / 50Hz | Water probe | Testing Scope 0–500ppm |
| Uniformity of spin coating | ±3% | Usage environment | 15–30℃ |
| Spin coating speed | Silicon wafers within 4 inches (inclusive): 300-8500RPM; Over 4 inches: 300-6000RPM |